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IAB Colloquium

The discussion series "Labour Market and Occupational Research (IAB-Colloquium zur Arbeitsmarkt- und Berufsforschung)" is a forum where primarily external researchers present the results of their work and discuss these with experts from IAB. Practitioners from the political, administrative and business fields are naturally also welcome.

Technological Rivalry and the Allocation of Talent: Evidence from China’s College Admission

IAB-Colloquium with Prof. Lei Li, PhD, Georg-August-University Göttingen

This paper studies how the U.S-China technology rivalry reshapes college admissions across fields of study using novel college admissions data from China.

Exploiting differential exposure to tariff escalation and export restrictions across major-region pairs over time, we find that more exposed pairs experience larger increases in admissions selectivity and enrollment, particularly for STEM majors and elite universities.

A one percentage point increase in the tariff exposure raises admission cutoff scores by 2-3 percent. Labor market returns shift in the same direction, with rising wage premia for STEM-related and R&D-intensive positions, consistent with a defensive-innovation channel in which rivalry pressure spurs self-reliance and innovation effort in China, increasing demand for science and high-end engineering skills.

Date

18.6.2026

, 11.00 a.m. until noon

Venue

Institute for Employment Research
Regensburger Straße 104
90478 Nürnberg
Room Re100 E10

or online via MS Teams

Further information

Researchers who like to participate, please send an e-mail to IAB.Colloquium@iab.de